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Special Section Technical Briefs

The Utility of Metal Artifact Reduction Techniques in the Postoperative Assessment of a Novel Tantalum Intervertebral Spacer Device on 3 T Magnetic Resonance Imaging: An In Vitro Study1

[+] Author and Article Information
Mark Macdonald, John Ferguson

Auckland City Hospital,
Auckland 1142, New Zealand

Jacob Munro

Auckland University Medical School,
Department of Surgery,
University of Auckland,
Auckland 1010, New Zealand

Keryn Reilly

Department of Anatomy with Radiology,
University of Auckland,
Auckland 1010, New Zealand

Jillian Cornish

Department of Medicine,
University of Auckland,
Auckland 1010, New Zealand

Gina Konz

Zimmer Spine,
Minneapolis, MN 55439

Andrea Champion

Centre for Advanced MRI,
University of Auckland,
Auckland 1010, New Zealand

Arier C. Lee

Epidemiology & Biostatistics,
University of Auckland,
Auckland 1010, New Zealand

Gerard Deib

Center for Advanced MRI,
University of Auckland,
Auckland 1010, New Zealand

Accepted and presented at The Design of Medical Devices Conference (DMD2015), April 13–16, 2015, Minneapolis, MN, USA.

Manuscript received March 3, 2015; final manuscript received May 7, 2015; published online July 16, 2015. Editor: Arthur Erdman.

J. Med. Devices 9(3), 030902 (Sep 01, 2015) (3 pages) Paper No: MED-15-1057; doi: 10.1115/1.4030594 History: Received March 03, 2015; Revised May 07, 2015; Online July 16, 2015

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References

Figures

Grahic Jump Location
Fig. 1

Superior view of porous Ta Ardis® lumbar implant left. Superior view of PEEK lumbar implant right.

Grahic Jump Location
Fig. 2

Superior view of porous Ta Ardis® lumbar implant left. Superior view of PEEK lumbar implant right.

Grahic Jump Location
Fig. 3

Axial T1 image lumbar spine without MARS: Ta device (left) and PEEK device (right). Small FOV, a high-resolution matrix, thin sections, and high gradient strengths result in images with a relatively small amount of metal artifact.

Grahic Jump Location
Fig. 4

Axial T1 image lumbar spine with MARS: Ta device (left) and PEEK device (right). Degree of metal artifact from both the implant and posterior metal hardware is further reduced allowing better assessment of key anatomical structures.

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