On the Formation of Photopolymerized Voxel With Varying Focal Length During Bulk Lithography

Unconstraint depth photopolymerization has been used in recently developed 3D microfabrication process termed as Bulk lithography for the development of varying depth 3D microstructures. Prediction of the curing behaviour is the key for successful implementation of the process towards the development of the varying depth 3D microstructure. This paper presents the evolution of the cured voxel resulting from unconstraint depth photopolymerization under off-focus condition (on either side of the focal point). Variation in cured geometry is presented in the non-dimensional way under off-focus condition. The simulation carried out has predicted the significant variation of cured width under off-focus condition. This works points towards an alternative way of varying the geometry of the cured voxel for bulk lithography by positioning of the focal point relative to the resin surface.